This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Emagin Corporation. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Howard Lin: Innovator in Direct Patterning Technology
Introduction
Howard Lin is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of material deposition technology. His innovative approach has led to the development of a unique patent that enhances the precision of patterning materials on substrates.
Latest Patents
Howard Lin holds a patent titled "System and method for direct patterning using a compensated shadow mask." This patent presents systems and methods for performing direct patterning of a material on a substrate with high fidelity to a desired pattern. The invention compensates the pattern of apertures in a shadow mask to accommodate a range of propagation angles in a vapor plume used for material deposition. The design of the shadow mask includes an aperture pattern where the position of each aperture is shifted inward toward the center based on its distance from the center. This innovative approach ensures that vaporized material passing through an aperture at a non-normal angle deposits accurately onto the substrate.
Career Highlights
Howard Lin is currently associated with Emagin Corporation, where he applies his expertise in material science and engineering. His work focuses on advancing technologies that improve the efficiency and accuracy of material deposition processes.
Collaborations
Some of his notable coworkers include Ilyas I Khayrullin and Fangchao Zhao, who contribute to the innovative environment at Emagin Corporation.
Conclusion
Howard Lin's contributions to direct patterning technology exemplify the impact of innovative thinking in material science. His patent reflects a significant advancement in the field, showcasing his dedication to enhancing precision in manufacturing processes.