The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Sep. 01, 2023
Emagin Corporation, Hopewell Junction, NY (US);
Ilyas I. Khayrullin, Hopewell Junction, NY (US);
Howard Lin, Hopewell Junction, NY (US);
Fangchao Zhao, Hopewell Junction, NY (US);
Timothy Considine, Hopewell Junction, NY (US);
Laurie Sziklas, Hopewell Junction, NY (US);
Kerry Tice, Hopewell Junction, NY (US);
Amalkumar P. Ghosh, Hopewell Junction, NY (US);
eMagin Corporation, Hopewell Junction, NY (US);
Abstract
Systems and methods for performing direct patterning of a material on a substrate with high fidelity to a desired pattern are presented. A pattern of apertures of a shadow mask is compensated to accommodate a range of propagation angles in a vapor plume used to deposit material onto the substrate through the shadow mask. A shadow mask in accordance with the present disclosure includes an aperture pattern in which aperture position is shifted inward toward the center of the shadow mask by an amount based on the distance of the aperture from the center of the shadow mask. As a result, vaporized material passing through an aperture at a non-normal angle deposits onto the substrate at its proper desired location.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile