This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1983.
Company Filing History:
Years Active: 1983
Title: The Innovations of Howard H. Hansen
Introduction
Howard H. Hansen is a notable inventor based in Underhill, Vermont, known for his contributions to semiconductor technology. He holds a patent that addresses a significant challenge in the field of ion implantation and laser annealing. His work has implications for improving the efficiency and effectiveness of semiconductor devices.
Latest Patents
Hansen's patent, titled "Method of laser annealing of subsurface ion implanted regions," presents a novel approach to annealing ion implanted regions buried in a semiconductor substrate. This method minimizes the undesirable effects of thermal diffusion by utilizing a continuous laser with an emission frequency longer than 600 nanometers. The buried ion implanted regions absorb this radiation strongly, while the unimplanted regions remain largely unaffected. Superior results are achieved when the substrate is heated to approximately 300 degrees during the laser annealing process. Hansen's innovative approach has the potential to enhance the performance of semiconductor devices significantly.
Career Highlights
Howard H. Hansen has made significant strides in his career, particularly through his work at International Business Machines Corporation (IBM). His expertise in semiconductor technology has positioned him as a valuable asset in the field. With a focus on improving manufacturing processes, Hansen's contributions have been instrumental in advancing the capabilities of semiconductor devices.
Collaborations
Hansen has collaborated with notable colleagues, including Jerome Brett Lasky and Ronald R. Silverman. These partnerships have fostered an environment of innovation and have led to advancements in semiconductor technology.
Conclusion
In summary, Howard H. Hansen is a distinguished inventor whose work in laser annealing and semiconductor technology has made a significant impact. His innovative methods and collaborations continue to influence the field, paving the way for future advancements in semiconductor manufacturing.