This inventor holds 2 USPTO granted patents. Top assignees: International Business Machines Corporation, Promerus, Lcc. Active years: 2008-2009.
Company Filing History:
2 out of 166,209 
2 out of 164 
Years Active: 2008-2009
Title: Howard A. Sidaway: Innovator in Photoresist Compositions
Introduction
Howard A. Sidaway is a notable inventor based in Brecksville, OH (US). He holds 2 patents that contribute significantly to the field of photoresist compositions. His work focuses on enhancing imaging properties through innovative methods.
Latest Patents
Sidaway's latest patents include a method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers, and monomers used for making such polymers. This patent provides a photoresist composition that encompasses a polymer with at least one polycyclic olefin repeat unit, derived from a polycyclic olefin monomer. The desired exo mole percent of these repeat units allows for better control of the differential dissolution rate, thereby enhancing imaging properties. Exemplary monomers with the desired exo mole percent are also included in this innovative work.
Career Highlights
Throughout his career, Sidaway has worked with prominent companies such as Promerus, LLC and IBM. His experience in these organizations has allowed him to develop and refine his expertise in the field of photoresist compositions.
Collaborations
Some of his notable coworkers include Larry Funderburk Rhodes and Chun S. Chang. Their collaboration has likely contributed to the advancements in the projects they have worked on together.
Conclusion
Howard A. Sidaway's contributions to the field of photoresist compositions through his patents and career experiences highlight his role as an innovator. His work continues to influence advancements in imaging technologies.