The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Oct. 31, 2007
Larry F. Rhodes, Silver Lake, OH (US);
Chun Chang, Stow, OH (US);
Leah J. Langsdorf, Akron, OH (US);
Howard A. Sidaway, Brecksville, OH (US);
Hiroshi Ito, San Jose, CA (US);
Larry F. Rhodes, Silver Lake, OH (US);
Chun Chang, Stow, OH (US);
Leah J. Langsdorf, Akron, OH (US);
Howard A. Sidaway, Brecksville, OH (US);
Hiroshi Ito, San Jose, CA (US);
Promerus LLC, Brecksville, OH (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided.