Anhui, China

Houyou Wang

This inventor holds 1 USPTO granted patent. Top assignee: Nexchip Semiconductor Co., Ltd. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Houyou Wang. Retrieved from https://idiyas.com/inventor/houyou-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Houyou Wang - Innovator in Semiconductor Technology

Introduction

Houyou Wang is a notable inventor based in Anhui, China. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique semiconductor structure and its manufacturing method.

Latest Patents

Houyou Wang holds a patent for a semiconductor structure and the method of manufacturing it. The patent outlines a comprehensive method that includes providing a substrate with distinct regions, forming a polycrystalline silicon layer, and creating a stacked structure. The process also involves the formation of a protective layer and a patterned photoresist layer, which are crucial for exposing specific areas of the substrate. This innovative method enhances the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Houyou Wang is currently employed at Nexchip Semiconductor Co., Ltd. His work at this company has allowed him to focus on advancing semiconductor technologies. His expertise in this area has positioned him as a valuable asset in the industry.

Collaborations

Some of his coworkers include Yongbo Feng and Hongbo Zhu. Their collaboration has likely contributed to the innovative projects at Nexchip Semiconductor Co., Ltd.

Conclusion

Houyou Wang's contributions to semiconductor technology through his patent and work at Nexchip Semiconductor Co., Ltd. highlight his role as an influential inventor in the field. His innovative methods are paving the way for advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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