Beijing, China

Houfeng Zhou

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Boe Technology Group Co., Ltd., Chongqing Boe Optoelectronics Technology Co., Ltd.. Active years: 2019.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Houfeng Zhou

Introduction

Houfeng Zhou is a notable inventor based in Beijing, China. He has made significant contributions to the field of display technology. His work has led to the development of innovative methods that enhance the efficiency and quality of display devices.

Latest Patents

One of Houfeng Zhou's key patents is titled "Patterning method employing half tone mask, array substrate and display device." This patent outlines a method that includes several steps: successively forming a first thin film layer, a second thin film layer, and a photoresist thin film layer on a substrate. The process involves exposing and developing the photoresist thin film layer using a half tone mask plate, followed by a series of etching and passivation steps. This innovative approach aims to improve the manufacturing process of display devices.

Career Highlights

Throughout his career, Houfeng Zhou has worked with prominent companies in the technology sector. He has been associated with BOE Technology Group Co., Ltd. and Chongqing BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has allowed him to contribute to various advancements in display technology.

Collaborations

Houfeng Zhou has collaborated with several professionals in his field, including Zhonghao Huang and Yongliang Zhao. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Houfeng Zhou's contributions to the field of display technology are noteworthy. His innovative patent and career achievements reflect his dedication to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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