This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Innovations of Hoong Shing Wong
Introduction
Hoong Shing Wong is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of gate dielectric materials.
Latest Patents
Wong holds a patent titled "Methods for doping high-K metal gates for tuning threshold voltages." This innovative method involves forming a first gate dielectric and a second gate dielectric over distinct semiconductor regions. It includes the deposition of a lanthanum-containing layer and a hard mask, which is free from both titanium and tantalum. The process further entails the formation of a patterned etching mask and an annealing step to drive lanthanum into the gate dielectric.
Career Highlights
Wong is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to advance semiconductor technologies. His work has been instrumental in enhancing the performance and efficiency of semiconductor devices.
Collaborations
Wong collaborates with Chun Hsiung Tsai, who is also a key contributor in their field. Their partnership has fostered innovative solutions in semiconductor manufacturing.
Conclusion
Hoong Shing Wong's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight his role as a significant inventor in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile