Schenectady, NY, United States of America

Hongyun Cottle

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 46(Granted Patents)


Location History:

  • Guilderland, NY (US) (2013)
  • Schenectady, NY (US) (2017 - 2019)

Company Filing History:


Years Active: 2013-2019

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: Innovations of Hongyun Cottle

Introduction

Hongyun Cottle is a notable inventor based in Schenectady, NY (US). He has made significant contributions to the field of etching technologies, holding a total of four patents. His work focuses on precision etching applications that are crucial in various technological advancements.

Latest Patents

One of his latest patents is a "Method of Quasi Atomic Layer Etching." This technique involves an etch process that incrementally etches a layer of material, akin to mono-layer etching of atomic layer etching (ALE), but without necessarily including the self-limiting, mono-layer action characteristic of ALE. This method is particularly beneficial for precision etching applications, such as during soft-mask openings. By controlling the polymer deposition relative to polymer-assisted etching through its temporal cycle, a very thin layer of conformal polymer can be activated to precisely etch and transfer desired patterns.

Another significant patent is related to "Graphoepitaxy Directed Self Assembly." This method includes grafting a conformal layer of a polymer brush onto a topographic substrate. A planarization material, which serves as a sacrificial material, is coated onto the substrate. The etch back process removes the polymer brush from the top surfaces, while the remaining portion is protected by the planarization material below the surface. This allows for the creation of a conformal polymer brush, which is then coated with a block copolymer and annealed to direct self-assembly, effectively mitigating island and hole defect formation.

Career Highlights

Hongyun Cottle has worked with prominent companies such as Tokyo Electron Limited and IBM. His experience in these organizations has contributed to his expertise in the field of etching technologies and materials science.

Collaborations

He has collaborated with notable individuals in his field, including Andrew W Metz and Cheng Chi, who is a woman. These collaborations have further enriched his work and innovations.

Conclusion

Hongyun Cottle's contributions to the field of etching technologies through his innovative patents demonstrate his significant impact on the industry. His work continues to influence advancements in precision etching applications.

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