Hong-Sub Lee

Title: Innovations of Hong-Sub Lee

Introduction

Hong-Sub Lee is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of memtransistor technology. His work focuses on innovative methods and applications that enhance electronic devices.

Latest Patents

One of Hong-Sub Lee's key patents is titled "Dual-gated memtransistor crossbar array, fabricating methods and applications of same." This invention features a memtransistor that includes a top gate electrode and a bottom gate electrode. It also incorporates a polycrystalline monolayer film formed of an atomically thin material, which is positioned between the two gate electrodes. Additionally, source and drain electrodes are spatially formed on the polycrystalline monolayer film to define a channel between them. The top and bottom gate electrodes are capacitively coupled with the channel, enhancing the functionality of the memtransistor.

Career Highlights

Hong-Sub Lee is affiliated with Northwestern University, where he continues to advance his research and innovations. His work has garnered attention in the academic and technological communities, contributing to the development of next-generation electronic components.

Collaborations

Some of his notable coworkers include Mark C Hersam and Vinod K Sangwan. Their collaborative efforts have furthered research in the field of memtransistors and related technologies.

Conclusion

Hong-Sub Lee's innovative contributions to memtransistor technology exemplify the potential of advanced materials in electronics. His work continues to influence the development of new applications in the field.