Hsinchu, Taiwan

Hong-Miao Chen

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hong-Miao Chen. Retrieved from https://idiyas.com/inventor/hong-miao-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2005

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Hong-Miao Chen in Contaminant Particle Removal

Introduction

Hong-Miao Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of particle removal technology. His innovative approach focuses on the use of optical tweezers to eliminate contaminant particles from surfaces without causing any damage.

Latest Patents

Hong-Miao Chen holds a patent for his invention titled "Contaminant particle removal by optical tweezers." This invention describes a method for removing contaminant particles from a surface by first recording the positional coordinates of all particles present. The process can selectively target only those particles that may cause current or future damage to the surface. Using optical tweezers, each particle is individually removed and disposed of, with six different methods outlined for this process. He has 1 patent to his name.

Career Highlights

Hong-Miao Chen is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work in the semiconductor industry has positioned him as a key player in advancing technologies that enhance surface integrity and cleanliness.

Collaborations

He has collaborated with notable colleagues such as Yu-Chang Jong and Huan-Chi Tseng, contributing to the development of innovative solutions in their field.

Conclusion

Hong-Miao Chen's work exemplifies the intersection of innovation and practical application in technology. His contributions to contaminant particle removal demonstrate the potential for advancements in maintaining surface integrity in various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…