Hong Guang Song

Title: Innovations of Hong Guang Song

Introduction

Hong Guang Song is a prominent inventor based in Wuhan, China. He has made significant contributions to the field of microstructure etching, holding a total of 2 patents. His work is characterized by innovative methods that enhance the efficiency and effectiveness of etching processes.

Latest Patents

One of Hong Guang Song's latest patents is an etching process with in-situ formation of a protective layer. In this method, a mask is formed on a microstructure over a substrate. The mask includes a first pattern over a first region of the microstructure and a second pattern over a second region of the microstructure. A first etching process is performed to etch the microstructure by providing an etching gas and applying a first bias voltage to the substrate according to the first and second patterns of the mask. A protective layer is subsequently formed by providing a deposition gas and applying a second bias voltage to the substrate to cover the first pattern of the mask. A second etching process is performed to transfer the second pattern of the mask further into the second region of the microstructure. The deposition gas has a higher carbon to fluorine ratio than the etching gas, and the second bias voltage is smaller than the first bias voltage.

Another patent by Hong Guang Song also focuses on an etching process with in-situ formation of a protective layer. In this disclosed method, a mask is formed on a microstructure. The mask includes a first pattern positioned over a first region of the microstructure and a second pattern positioned over a second region of the microstructure. A first etching process is performed to etch the microstructure according to the first and second patterns formed in the mask. The first etching process transfers the first and second patterns of the mask into the first and second regions of the microstructure, respectively. A protective layer is subsequently formed over the first pattern of the mask that is positioned over the first region of the microstructure. When the protective layer is formed, a second etching process is performed to etch the microstructure and transfer the second pattern of the mask further into the second region of the microstructure. The method also includes removing the mask and the protective layer from the microstructure.

Career Highlights

Hong Guang Song is currently employed at Yangtze Memory Technologies Co., Ltd. His work at this company has allowed him to