This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 1999-2002.
Company Filing History:
Years Active: 1999-2002
Title: Innovations of Hong Ching Shan
Introduction
Hong Ching Shan is a prominent inventor based in San Jose, CA (US). She has made significant contributions to the field of semiconductor fabrication, holding a total of 2 patents. Her work focuses on enhancing plasma processing techniques, which are crucial for the development of advanced semiconductor devices.
Latest Patents
Hong Ching Shan's latest patents include innovative technologies that improve plasma-assisted processing. One of her notable inventions is the "Plasma assisted processing chamber with separate control of species density." This invention provides an apparatus and method for plasma-assisted processing of a workpiece, allowing for separate control of species density within a processing plasma. The design features a processing chamber and at least one collateral chamber capable of generating a collateral plasma and delivering it to the processing chamber. This invention enables precise control over the densities of particle species within the processing plasma.
Another significant patent is "Adjusting DC bias voltage in plasma chambers." This method involves adjusting the cathode DC bias in a plasma chamber for fabricating semiconductor devices. It utilizes a dielectric shield positioned between the plasma and selected grounded components of the chamber. By controlling various parameters, such as the surface area blocked by the dielectric shield and the thickness of the dielectric, the invention effectively reduces unwanted particle deposition on exhaust pump components.
Career Highlights
Hong Ching Shan is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work at Applied Materials has allowed her to contribute to cutting-edge technologies that drive advancements in semiconductor manufacturing.
Collaborations
Throughout her career, Hong has collaborated with notable colleagues, including Michael N Grimbergen and Peter K Loewenhardt. These collaborations have further enriched her research and development efforts in the field of plasma processing.
Conclusion
Hong Ching Shan's innovative patents and contributions to semiconductor technology highlight her role as a leading inventor in her field. Her work continues to influence advancements in plasma-assisted processing, showcasing her commitment to innovation and excellence.