Company Filing History:
2 out of 6 
1 out of 1 Years Active: 2012
Title: Holger Brosche: Innovator in Photolithography and Automation
Introduction
Holger Brosche is a notable inventor based in Dresden, Germany. He has made significant contributions to the fields of photolithography and automation, holding a total of 3 patents. His innovative designs have advanced the technology used in wafer processing and mask handling.
Latest Patents
One of Holger Brosche's latest patents is a "Wafer catching device." This invention relates to a device designed to catch a plurality of slices detached from a holding element. It features a frame, a holder for accommodating the holding element, guiding elements on the sides, and a bottom catching element. The guiding elements are arranged in pairs on both the right and left sides of the frame.
Another significant patent is for an "Apparatus and method for the removal of pellicles from masks." This invention provides a universal method for removing pellicles from masks used in photolithographic processes without causing contamination or damage. The apparatus includes grips for manipulating masks, detectors for contactless position determination, and a heating device for adhesive removal.
Career Highlights
Holger Brosche has worked with several companies throughout his career, including Deutsche Solar GmbH and Hap Handhabungs-, Automatisierungs- und Präzisionstechnik GmbH. His experience in these organizations has contributed to his expertise in automation and precision technology.
Collaborations
Holger has collaborated with notable coworkers such as Hans-Joachim Gretzschel and Steffen Pollack. Their combined efforts have fostered innovation in their respective fields.
Conclusion
Holger Brosche's contributions to the fields of photolithography and automation are noteworthy. His patents reflect a commitment to advancing technology and improving processes in wafer handling and mask manipulation. His work continues to influence the industry positively.