Seoul, South Korea

Hoijun Kim

This inventor holds 1 USPTO granted patent. Top assignee: Kwangwoon University Industry-Academic Collaboration Foundation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hoijun Kim. Retrieved from https://idiyas.com/inventor/hoijun-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hoijun Kim: Innovator in Facial Recognition Technology

Introduction

Hoijun Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of facial recognition technology, particularly through his innovative patent that enhances face registration methods.

Latest Patents

Hoijun Kim holds a patent for a "Method and apparatus for obtaining first and second images to detect first and second landmarks and face registration using 3D facial landmark." This patent outlines a face registration method that involves obtaining first and second face image data captured at different angles, sizes, or locations. The method includes detecting landmarks, calculating movement and distance between them, and matching these landmarks by adjusting their position, angle, and size based on reference landmarks.

Career Highlights

Hoijun Kim is affiliated with the Kwangwoon University Industry-Academic Collaboration Foundation, where he applies his expertise in facial recognition technology. His work has been instrumental in advancing the capabilities of face registration systems.

Collaborations

He collaborates with notable colleagues, including Jaeseung Kim and Soonchul Kwon, who contribute to his research and development efforts in the field.

Conclusion

Hoijun Kim's innovative work in facial recognition technology exemplifies the impact of his contributions to the industry. His patent reflects a significant advancement in face registration methods, showcasing his dedication to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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