This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Centre National De Recherche Scientifique, Cergy Paris University, Université Paris-Saclay. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2026
Title: Hocine Khemliche: Innovator in Surface Analysis Technology
Introduction
Hocine Khemliche is a notable inventor based in Viry Chatillon, France. He has made significant contributions to the field of surface analysis technology. His innovative work has led to the development of a unique device that enhances the understanding of surface characteristics in various environments.
Latest Patents
Hocine Khemliche holds a patent for a "Device for analysing surfaces using fast atom diffraction in a high-pressure environment." This device is designed to characterize the surface of a sample effectively. It includes a chamber that maintains a pressure below 10-2 mbar, connected to a primary pump. The device features a source that generates an incident beam of neutral atoms or molecules with energies ranging from 50 eV to 5 keV. The beam is directed at an angle of incidence of less than or equal to 10° relative to the surface plane, allowing for precise surface characterization.
Career Highlights
Throughout his career, Hocine Khemliche has worked with esteemed institutions such as the Centre National de Recherche Scientifique and Université Paris-Saclay. His experience in these organizations has contributed to his expertise in surface analysis and related technologies.
Collaborations
Hocine has collaborated with notable colleagues, including Anouchah Momeni and Tiberiu Minea. These partnerships have further enriched his research and development efforts in the field.
Conclusion
Hocine Khemliche's contributions to surface analysis technology through his innovative patent and collaborations highlight his role as a significant inventor in this domain. His work continues to influence advancements in surface characterization methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile