The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Jun. 02, 2022
Applicants:

Centre National DE LA Recherche Scientifique, Paris, FR;

Universite Paris-saclay, Gif-sur-Yvette, FR;

CY Cergy Paris Universite, Cergy Pontoise, FR;

Inventors:

Hocine Khemliche, Viry Chatillon, FR;

Anouchah Momeni, Boulogne Billancourt, FR;

Tiberiu Minea, Paris, FR;

Elena-Magdalena Staicu-Casagrande, Limours, FR;

Sylvain Lupone, Saint Aubin, FR;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/2055 (2018.01); C23C 14/35 (2006.01); G01N 23/201 (2018.01); G01N 23/207 (2018.01);
U.S. Cl.
CPC ...
G01N 23/201 (2013.01); C23C 14/35 (2013.01); G01N 23/2055 (2013.01); G01N 23/207 (2013.01);
Abstract

A device for characterizing a surface of a sample, including; —a chamber comprising a medium for the sample, the chamber being connected to a pump, referred to as the primary pump, suitable for maintaining a pressure below 10-2 mbar within the chamber; —a source for generating an incident beam of neutral atoms or molecules having an energy of between 50 eV and 5 keV, with a divergence less than or equal to 0.05°, the source being arranged to direct the incident beam within the chamber through an inlet to the surface to be characterized with an angle of incidence less than or equal to 10° relative to the plane of the surface.


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