San Jose, CA, United States of America

Ho T Fang

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2006-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ho T Fang. Retrieved from https://idiyas.com/inventor/ho-t-fang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2006-2007

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2 patents (USPTO):Explore Patents

Title: The Innovations of Ho T Fang

Introduction

Ho T Fang is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

One of his latest patents is for a "Cylinder for Thermal Processing Chamber." This invention features a core made from heat-resistant or insulating material, with a coating that is opaque to infrared radiation. The design includes inner and outer side walls, with the outer wall positioned further from the central axis than the inner wall. The first end of the cylinder is designed to contact an edge ring that supports a semiconductor substrate. The core is preferably made from quartz or ceramics, while the coating is made from polysilicon.

Another notable patent is for "Erosion Resistant Process Chamber Components." This invention addresses the issue of erosion in energized gas environments. The component is constructed from a ceramic structure composed of aluminum oxide, which significantly reduces surface erosion. The ceramic structure has a specific grain size and purity, ensuring enhanced durability and performance in semiconductor processing applications.

Career Highlights

Ho T Fang is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on developing advanced materials and components that improve the efficiency and reliability of semiconductor manufacturing processes.

Collaborations

Throughout his career, Ho T Fang has collaborated with notable colleagues, including Sundar Ramamurthy and Vedapuram S Achutharaman. These partnerships have contributed to the advancement of innovative technologies in the semiconductor field.

Conclusion

Ho T Fang's contributions to semiconductor processing through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the industry. His inventions continue to influence the development of more efficient and reliable semiconductor technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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