Yokohama, Japan

Hitoshi Onoda

This inventor holds 25 USPTO granted patents and 2 EPO patents, primarily in Image Processing Technology. Top assignees: Asahi Glass Company, Limited, Canon Kabushiki Kaisha, Other. Active years: 1996-2015.


% Patents Active = 76.0


Average Co-Inventor Count = 2.7

ph-index = 11

Forward Citations = 753(Granted Patents)


Location History:

  • Kanagawa, JP (2001 - 2005)
  • Koriyama, JP (2012)
  • Yokohama, JP (1996 - 2015)

Company Filing History:


Years Active: 1996-2015

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Areas of Expertise:
Image Processing
Glass Composition
Optical Device
Ceramic Color Composition
Focus Detection
Plasma Display Panel
Image Edit Device
Electrode-Formed Glass
Distance Measuring
Curved Glass Plate
25 patents (USPTO):Explore Patents

Title: The Innovative Journey of Hitoshi Onoda

Introduction: Hitoshi Onoda is a renowned inventor hailing from Yokohama, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Hitoshi Onoda holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous innovation and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Hitoshi Onoda has worked with leading research institutions and tech companies, spearheading projects that have revolutionized the industry. His dedication to pushing the boundaries of technology has earned him recognition worldwide.

Collaborations: Throughout his career, Hitoshi Onoda has collaborated with top engineers, scientists, and designers, fostering a culture of creativity and excellence. His ability to work in multidisciplinary teams has led to the development of cutting-edge solutions that have had a lasting impact.

Conclusion: Hitoshi Onoda's passion for innovation, coupled with his technical expertise, has solidified his position as a trailblazer in the world of technology. His relentless pursuit of excellence continues to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.
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