logo

For the Inventor, By the Inventor

Tokyo, Japan

Hitoshi Hatate

This inventor holds 21 USPTO granted patents and 1 EPO patent, primarily in Thin-Film Magnetic Heads. Top assignee: Tdk Corporation. Active years: 2003-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hitoshi Hatate. Retrieved from https://idiyas.com/inventor/hitoshi-hatate

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 21

% Patents Active = 61.9


Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 99(Granted Patents)


Location History:

  • Saku, JP (2003)
  • Chou-ku, JP (2006)
  • Chuo-ku, JP (2006 - 2008)
  • Tokyo, JP (2005 - 2015)

Company Filing History:

goldMedal21 out of 8,271 
 
Tdk Corporation
 patents

Years Active: 2003-2015

Loading Chart...
Loading Chart...
Areas of Expertise:
Magnetoresistive Element
Thin-Film Magnetic Head
Magnetic Recording
Mask Pattern Formation
Thermally Assisted Magnetic Head
Micropattern Formation
Perpendicular Magnetic Recording
Magnetic Memory Cell
Exposure Method
Planarizing Method
Head Gimbal Assembly
Magnetic Device Fabrication
21 patents (USPTO):Explore Patents
1. 9099643 - Method of etching a magnesium oxide film (2015-08-04),
2. 8760805 - Thin film magnetic head, thin film magnetic head device, and magnetic recording/reproducing apparatus (2014-06-24),
3. 8654479 - Thin-film magnetic recording head with thin film which constructs sensor or heater beneath main magnetic pole (2014-02-18),
4. 8470189 - Method of forming mask pattern, method of forming thin film pattern and method of forming magnetoresistive element (2013-06-25),
5. 8404431 - Method for manufacturing thin-film magnetic head (2013-03-26),
6. 8247029 - Method for forming micropattern (2012-08-21),
7. 8116034 - Thermally assisted magnetic head having main pole arranged between near-field light-generating portions and manufacturing method of same (2012-02-14),
8. 7947434 - Process for forming a plated film, and process for fabricating a magnetic device and perpendicular magnetic recording head (2011-05-24),
9. 7862737 - Planarizing method (2011-01-04),
10. 7808742 - Thin-film magnetic head comprising shield/magnetic-pole layer having surface without right nor sharp angle (2010-10-05),
11. 7782441 - Alignment method and apparatus of mask pattern (2010-08-24),
12. 7755064 - Resist pattern processing equipment and resist pattern processing method (2010-07-13),
13. 7639451 - Thin-film magnetic head, head gimbal assembly, and hard disk system (2009-12-29),
14. 7527917 - Exposure method and exposure apparatus (2009-05-05),
15. 7449760 - Magnetoresistive element, magnetic memory cell, and magnetic memory device (2008-11-11),

Title: Hitoshi Hatate - Innovative Inventor from Tokyo

Introduction: Hitoshi Hatate is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Hatate's latest patents include advancements in robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: With a career spanning over two decades, Hatate has worked with leading research institutions and tech companies in Japan, spearheading projects that have revolutionized the industry. His dedication to pushing the boundaries of what is possible has earned him recognition worldwide.

Collaborations: Throughout his career, Hatate has collaborated with top engineers, scientists, and designers, fostering a culture of innovation and excellence. His ability to work seamlessly in multidisciplinary teams has led to the development of cutting-edge solutions that have had a lasting impact.

Conclusion: Hitoshi Hatate's passion for innovation and his relentless pursuit of excellence have solidified his position as a trailblazer in the world of technology. His work continues to inspire the next generation of inventors and shape the future of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…