Location History:
- Niigata, JP (2006 - 2007)
- Shibata, JP (2007)
Company Filing History:
Years Active: 2006-2007
Title: Hisatsugu Kurita: Innovator in Silicon Wafer Technology
Introduction
Hisatsugu Kurita is a prominent inventor based in Niigata, Japan. He has made significant contributions to the field of silicon wafer technology, holding a total of 3 patents. His work focuses on innovative manufacturing methods that enhance the quality and performance of silicon wafers.
Latest Patents
Kurita's latest patents include a manufacturing method for strained silicon wafers. This method involves several steps, starting with the preparation of a single crystal silicon substrate. The process continues with the formation of a graded SiGe layer, which has a Ge composition ratio that increases stepwise from 5% to 60% at the atomic level. Following this, a SiGe constant composition layer is formed, maintaining a Ge composition ratio similar to that of the graded layer's surface. Finally, a strained Si layer is created on top of the SiGe constant composition layer, with the second through fourth steps performed under reduced pressure while the substrate is rotated at speeds between 300 rpm and 1500 rpm. Another notable patent is a silicon wafer cleaning method. This method aims to achieve a silicon wafer with micro roughness under a spatial frequency of 20/μm, ranging from 0.3 to 1.5 nm in terms of power spectrum density. The process includes oxidizing the silicon wafer with ozonized water and subsequently cleaning the oxidized wafer with hydrofluoric acid. This innovative approach effectively removes surface pollutants, including particles and metallic foreign matter, while maintaining the surface structure of the silicon wafer at an atomic level through annealing.
Career Highlights
Kurita is associated with Toshiba Ceramics Co., Ltd., where he applies his expertise in silicon wafer technology. His work has been instrumental in advancing the manufacturing processes within the company, contributing to the development of high-quality silicon wafers used in various applications.
Collaborations
Some of his notable coworkers include Masato Igarashi and Takeshi Senda. Their collaborative efforts have further enhanced the research and development initiatives at Toshiba Ceramics Co., Ltd.
Conclusion
Hisatsugu Kurita's innovative contributions to silicon wafer technology have established him as a key figure in the field. His patents reflect a commitment to improving manufacturing processes and product quality. His work continues to influence advancements in semiconductor technology.