Funabashi, Japan

Hisato Hayashi

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Chiba, JP (2019)
  • Tokyo, JP (2022)
  • Funabashi, JP (2013 - 2024)

Company Filing History:


Years Active: 2013-2024

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12 patents (USPTO):Explore Patents

Title: Hisato Hayashi: Innovator in Liquid Medium Composition

Introduction

Hisato Hayashi is a prominent inventor based in Funabashi, Japan. He has made significant contributions to the field of liquid medium compositions, holding a total of 12 patents. His innovative methods and devices have advanced the production of liquid culture mediums, showcasing his expertise and creativity.

Latest Patents

Hayashi's latest patents include a method and device for producing a liquid culture medium composition. This invention involves a junction conduit structure that allows for the mixing of two liquids, resulting in a liquid medium composition containing structures formed by a particular compound linked via a linking substance. Another notable patent is a method for preparing a liquid medium composition, which simplifies the mixing of liquids containing linking substances with those containing particular compounds. This method enables the production of a liquid medium composition with fine structures dispersed throughout.

Career Highlights

Throughout his career, Hayashi has worked with notable companies such as Nissan Chemical Industries Limited and Nissan Chemical Corporation. His experience in these organizations has contributed to his development as an inventor and has provided him with valuable insights into the industry.

Collaborations

Hayashi has collaborated with esteemed colleagues, including Masaaki Ozawa and Takeshi Suwa. These partnerships have likely fostered an environment of innovation and creativity, further enhancing his contributions to the field.

Conclusion

Hisato Hayashi's work in liquid medium compositions exemplifies the spirit of innovation. His patents and career achievements reflect his dedication to advancing technology in this area. His contributions will continue to influence the field for years to come.

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