Sakura, Japan

Hisashi Tanimoto

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Dic Corporation. Active years: 2019.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 1


Location History:

  • Sakura, JP (2019)
  • Chiba, JP (2019)

Company Filing History:


Years Active: 2019

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2 patents (USPTO):Explore Patents

Title: Hisashi Tanimoto: Innovator in Curable Compositions

Introduction

Hisashi Tanimoto is a notable inventor based in Sakura, Japan. He has made significant contributions to the field of curable compositions, with a focus on materials that enhance precision in pattern transfer and etching resistance. His innovative work has led to the development of two patents that showcase his expertise and creativity.

Latest Patents

Hisashi Tanimoto's latest patents include a curable composition for imprinting. This composition contains a polymerizable compound with specific concentrations of polymerizable groups and parameters that optimize its performance. The viscosity of the composition is carefully controlled to ensure its effectiveness in various applications. Another significant patent involves a curable composition, resist material, and resist film that addresses the challenges of forming a resist that is easily washable after curing. This invention emphasizes high dry etching resistance and excellent precision in fine pattern transfer.

Career Highlights

Hisashi Tanimoto is associated with Dic Corporation, where he continues to push the boundaries of innovation in curable compositions. His work has been instrumental in advancing technologies that are crucial for various industrial applications.

Collaborations

Hisashi collaborates with talented individuals such as Makoto Yada and Takeshi Ibe, contributing to a dynamic environment of innovation and creativity.

Conclusion

Hisashi Tanimoto's contributions to the field of curable compositions reflect his dedication to innovation and excellence. His patents not only demonstrate his technical expertise but also pave the way for advancements in material science.

Profile summary based on public USPTO records.
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