This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Kokusai Electric Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Hisashi Nomura: Innovator in Semiconductor Technology
Introduction
Hisashi Nomura is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative approaches to gas cleaning methods.
Latest Patents
Hisashi Nomura holds 1 patent for a gas cleaning method, which includes several key processes. The method involves removing a first metal element from a process chamber by supplying a chlorine-containing gas without the presence of an oxygen-containing gas. Following this, a second metal element is removed by introducing an oxygen-containing gas into the chamber, ensuring that the second step occurs after the first.
Career Highlights
Nomura is associated with Kokusai Electric Corporation, a leading company in the semiconductor manufacturing industry. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor device production.
Collaborations
Hisashi Nomura has collaborated with notable colleagues, including Takahiro Kobayashi and Iwao Nakamura. Their combined expertise has contributed to advancements in semiconductor technologies.
Conclusion
Hisashi Nomura's innovative work in gas cleaning methods showcases his dedication to improving semiconductor manufacturing processes. His contributions continue to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile