Saitama, Japan

Hisashi Naoshima

This inventor holds 1 USPTO granted patent. Top assignee: Sony Corporation. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisashi Naoshima. Retrieved from https://idiyas.com/inventor/hisashi-naoshima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 17.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Hisashi Naoshima: Innovator in Electronics Packaging

Introduction

Hisashi Naoshima is a prominent inventor based in Saitama, Japan. He is known for his contributions to the field of electronics packaging, particularly through his innovative patent that enhances the efficiency of electronic device mounting systems.

Latest Patents

Naoshima holds a patent for a "System for mounting electronic device." This electronics packaging system includes a printer, a placing unit, and a reflow unit. The system allows a printed wiring board to be carried in an upright position while having solder printed on all lands simultaneously. This design enables electronic parts to be placed and soldered to the lands at the same time, resulting in a more compact system and a shorter packaging time. He has 1 patent to his name.

Career Highlights

Hisashi Naoshima is currently employed at Sony Corporation, where he continues to innovate and contribute to advancements in electronics. His work has significantly impacted the efficiency of electronic device manufacturing processes.

Collaborations

Naoshima has collaborated with notable coworkers, including Minoru Shimada and Kazuhisa Mochida, who have also contributed to the field of electronics.

Conclusion

Hisashi Naoshima's innovative work in electronics packaging exemplifies the importance of efficiency in modern technology. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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