Tokyo, Japan

Hisashi Maejima

This inventor holds 2 USPTO granted patents. Top assignees: Renesas Technology Corp., Other. Active years: 2001-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisashi Maejima. Retrieved from https://idiyas.com/inventor/hisashi-maejima-9gqurlyd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2001-2008

Loading Chart...
2 patents (USPTO):Explore Patents

Title: **Hisashi Maejima: Innovator in Semiconductor Fabrication**

Introduction

Hisashi Maejima, based in Tokyo, Japan, is a distinguished inventor known for his contributions to semiconductor technology. With a portfolio of two patents, he has made significant advancements in the design and fabrication of wafers used in integrated circuits.

Latest Patents

Hisashi Maejima's latest patents include:

1. **Wafer having chamfered bend portions in the joint regions between the contour of the cut-away portion of the wafer** - This innovation addresses the problem of chipping during processing. By incorporating chamfered bent portions, Maejima enhances the wafer’s structural integrity, ensuring better performance during the coating with photoresist and the formation of epiaxially grown layers.

2. **Process for fabrication of semiconductor device, semiconductor wafer for use in the process and process for the preparation of the wafer** - This patent describes a method using a double-side mirror-polished wafer. It features a unique chamfered angle design at the notched areas, allowing for optical discrimination, which facilitates the handling and manufacturing of integrated circuits. This process aims to maintain the symmetry of the wafer, thus optimizing the yield of available integrated circuits.

Career Highlights

Throughout his career, Hisashi Maejima has worked with esteemed organizations such as Renesas Technology Corporation. His contributions have been pivotal in enhancing wafer technology, which is crucial for the production of semiconductor devices. His work has not only improved manufacturing processes but also led to higher efficiency in semiconductor fabricability.

Collaborations

During his tenure in the industry, Maejima collaborated with notable professionals including Tomomi Sato and Norio Suzuki. These collaborations have likely contributed to the innovation of his patented technologies and the overall advancement of semiconductor fabrication practices.

Conclusion

Hisashi Maejima exemplifies the spirit of innovation in semiconductor technology. With his groundbreaking patents and collaborative efforts, he continues to influence the way wafers are designed and fabricated, ensuring that the future of integrated circuit production remains at the forefront of technological advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…