Mie, Japan

Hisashi Katsumata


Average Co-Inventor Count = 6.9

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014-2019

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2 patents (USPTO):Explore Patents

Title: Hisashi Katsumata: Innovator in Aramid Resin Technology

Introduction

Hisashi Katsumata is a notable inventor based in Mie, Japan. He has made significant contributions to the field of materials science, particularly in the development of aramid resin film laminates. With a total of 2 patents to his name, his work showcases innovative approaches to enhancing the properties of composite materials.

Latest Patents

Katsumata's latest patents include an aramid resin film laminate and a method for producing the same. The aramid-resin film laminate comprises an aramid paper that includes an aramid fibrid and an aramid short fiber, laminated with a resin film. This laminate is created through a plasma treatment on the surface of the aramid paper, which allows for bonding without the use of adhesive agents. The resulting laminate exhibits excellent heat resistance, electrical characteristics, and mechanical strength. Another significant patent involves a method of manufacturing an adhesive-free laminate of aramid paper and polyphenylene sulfide film, which is particularly useful as an insulation material for rotating electric machinery.

Career Highlights

Throughout his career, Katsumata has worked with reputable companies such as Kawamura Sangyo Co., Ltd. and Hitachi Engineering & Services Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced materials.

Collaborations

Katsumata has collaborated with notable colleagues, including Masashi Kato and Kenichirou Tada. These partnerships have likely fostered innovation and the exchange of ideas in their respective fields.

Conclusion

Hisashi Katsumata's contributions to the field of aramid resin technology highlight his innovative spirit and dedication to advancing material science. His patents reflect a commitment to creating high-performance materials that meet the demands of modern applications.

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