Hisashi Kasahara

Title: Hisashi Kasahara: Innovator in Photomask Technology

Introduction

Hisashi Kasahara is a prominent inventor based in Shinjuku-ku, Japan. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His work focuses on advancements in mask blank glass substrates and their manufacturing methods.

Latest Patents

Hisashi Kasahara's latest patents include innovative technologies such as the mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method. The mask blank glass substrate is designed for use in manufacturing a mask blank. It features a marker that expresses information for identifying or managing the mask blank glass substrate, formed on a surface that does not influence the formation of a transfer pattern. Each pit forming the marker is a round hole with a generally circular edge, and the distance between adjacent pits is 50 µm or more. This marker is typically located on an end face of the mask blank glass substrate. Additionally, his photomask manufacturing method includes steps for storing defect information of a mask blank, determining its placing orientation, and performing rotation control to ensure proper alignment with the exposure/writing apparatus.

Career Highlights

Hisashi Kasahara is associated with Hoya Corporation, a leading company in optical products and photomask technology. His work has been instrumental in enhancing the efficiency and accuracy of photomask manufacturing processes.

Collaborations

Some of his notable coworkers include Yasushi Okubo and Akinori Kurikawa, who have collaborated with him on various projects within the field.

Conclusion

Hisashi Kasahara's contributions to photomask technology and his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in manufacturing processes and product quality.