The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Jun. 25, 2009
Yasushi Okubo, Shinjuku-ku, JP;
Hisashi Kasahara, Shinjuku-ku, JP;
Yasushi Okubo, Shinjuku-ku, JP;
Hisashi Kasahara, Shinjuku-ku, JP;
Hoya Corporation, Tokyo, JP;
Abstract
A photomask manufacturing method includes a defect information storage step of storing defect information of a mask blank, provided with an identification marker on an end face thereof, into an information storage device in correspondence to the identification marker, a placing orientation determination step of determining a placing orientation of the mask blank with respect to an exposure/writing apparatus, and an orientation correction step of performing rotation control of a rotating apparatus so that an orientation of the mask blank coincides with the determined placing orientation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile