Kiyosu, Japan

Hisao Sato

This inventor holds 1 USPTO granted patent. Top assignees: Powdec K.k., Toyoda Gosei. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisao Sato. Retrieved from https://idiyas.com/inventor/hisao-sato-hgtfcpdu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hisao Sato and Semiconductor Innovation.

Introduction

Hisao Sato is an inventor associated with Kiyosu, Japan. His patent work includes a semiconductor element and device designed around layered semiconductor materials and electrodes.

Latest Patents

Sato is listed as an inventor on 1 patent, titled “Semiconductor Element and Device.” The invention describes a semiconductor element with four semiconductor layers, two intermediate layers, and source, drain, and gate electrodes. The second semiconductor layer has a larger band gap than the first and third semiconductor layers. The two intermediate layers sandwiching it have band gaps larger than that of the second semiconductor layer.

Career Highlights

Sato’s listed company affiliations include Toyoda Gosei and Powdec K.K. The available information does not specify his roles or the dates of these affiliations.

Collaborations

His listed coworkers include Koji Okuno and Daisuke Shinoda.

Conclusion

Hisao Sato’s recorded patent highlights work on semiconductor-layer structures and electrodes, alongside professional associations with Toyoda Gosei and Powdec K.K.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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