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For the Inventor, By the Inventor

Austin, TX, United States of America

Hisao Kawasaki

USPTO Granted Patents = 12

Average Co-Inventor Count = 2.5

ph-index = 10

Forward Citations = 293(Granted Patents)


Company Filing History:

goldMedal12 out of 20,290 
 
Motorola Corporation
 patents

Years Active: 1993-2001

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12 patents (USPTO):Explore Patents
1. 6218733 - Semiconductor device having a titanium-aluminum compound (2001-04-17),
2. 5623166 - Al-Ni-Cr conductive layer for semiconductor devices (1997-04-22),
3. 5593919 - Process for forming a semiconductor device including conductive members (1997-01-14),
4. 5506450 - Semiconductor device with improved electromigration resistance and (1996-04-09),
5. 5483094 - Electrically programmable read-only memory cell (1996-01-09),
6. 5420072 - Method for forming a conductive interconnect in an integrated circuit (1995-05-30),
7. 5393703 - Process for forming a conductive layer for semiconductor devices (1995-02-28),
8. 5382540 - Process for forming an electrically programmable read-only memory cell (1995-01-17),
9. 5358901 - Process for forming an intermetallic layer (1994-10-25),
10. 5317185 - Semiconductor device having structures to reduce stress notching effects (1994-05-31),
11. 5240558 - Method for forming a semiconductor device (1993-08-31),
12. 5190893 - Process for fabricating a local interconnect structure in a (1993-03-02),

Title: Innovator Spotlight: Hisao Kawasaki

Introduction: Hisao Kawasaki is a prominent inventor based in Austin, TX, known for his significant contributions to semiconductor technology. With an impressive portfolio of 12 patents, Kawasaki has made advancements that drive innovations in the electronic and semiconductor industries.

Latest Patents: Among his most recent patents are two notable inventions that enhance semiconductor devices. The first patent involves a semiconductor device having a titanium-aluminum compound, which includes a process for forming an intermetallic layer. This invention details how a metal-containing layer reacts with a metal-containing gas to create titanium aluminide on the sides of an interconnect, efficiently performed at temperatures no greater than 700 degrees Celsius. The second significant patent describes an aluminum-nickel-chromium (Al-Ni-Cr) conductive layer. This layer, utilized as an interconnect within semiconductor devices, demonstrates exceptional resistance to electromigration and corrosion, featuring specific weight percentages of nickel and chromium that facilitate its deposition and patterning.

Career Highlights: Hisao Kawasaki is currently associated with Motorola Corporation, where he utilizes his expertise to advance semiconductor technology. His work is recognized for pushing the boundaries of current technology, promoting innovative solutions that address the needs of the rapidly evolving electronics market.

Collaborations: Throughout his career, Kawasaki has collaborated with esteemed colleagues, including Johnson O Olowolafe and Chii-Chang Lee. Their collective expertise contributes to the development of groundbreaking technologies, strengthening the impact of their joint innovations within the semiconductor field.

Conclusion: Hisao Kawasaki stands out as a key innovator in the semiconductor industry, with a footprint marked by 12 patents that reflect his commitment to advancing technology. His latest inventions not only enhance device performance but also pave the way for future innovations. As he continues to collaborate with fellow experts at Motorola Corporation, his contributions will undoubtedly shape the future landscape of the electronics industry.

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