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For the Inventor, By the Inventor

Tokyo, Japan

Hisanori Akimaru

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Jsr Corporation. Active years: 2016-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisanori Akimaru. Retrieved from https://idiyas.com/inventor/hisanori-akimaru

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Location History:

  • Minato-ku, JP (2016)
  • Tokyo, JP (2018)

Company Filing History:

goldMedal2 out of 1,078 
 
Jsr Corporation
 patents

Years Active: 2016-2018

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2 patents (USPTO):Explore Patents
1. 10095110 - Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern (2018-10-09),
2. 9417522 - Photosensitive resin composition and method for producing resist pattern (2016-08-16),

Title: Hisanori Akimaru: Innovator in Photosensitive Resin Technology

Introduction

Hisanori Akimaru is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive resin compositions, which are essential in various applications, including semiconductor manufacturing and printed circuit boards. His innovative work has led to the development of multiple patents that enhance the efficiency and effectiveness of resist patterns.

Latest Patents

Hisanori Akimaru holds 2 patents related to photosensitive resin technology. His latest patents include a photosensitive resin composition and a method for forming resist patterns. The first patent provides a photosensitive resin composition that includes an alkali-soluble resin, a compound with ethylenically unsaturated double bonds, and a photo radical polymerization initiator with an oxime ester structure. This composition allows for improved performance in resist pattern formation. The second patent also focuses on a photosensitive resin composition, emphasizing the importance of the photo radical polymerization initiator's content in relation to other components. This innovation enables the formation of resist patterns with excellent resolution without the need for an oxygen inhibition layer.

Career Highlights

Hisanori Akimaru is currently associated with JSR Corporation, a leading company in the field of advanced materials. His work at JSR Corporation has been instrumental in pushing the boundaries of photosensitive resin technology. His contributions have not only advanced the company's research but have also had a significant impact on the industry as a whole.

Collaborations

Throughout his career, Akimaru has collaborated with notable colleagues, including Hirokazu Sakakibara and Takeshi Watanabe. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hisanori Akimaru's work in photosensitive resin technology exemplifies the spirit of innovation. His patents and contributions to JSR Corporation highlight his role as a key player in advancing materials science. His ongoing efforts continue to shape the future of this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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