logo

For the Inventor, By the Inventor

Koshi, Japan

Hisakazu Nakayama

This inventor holds 5 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2003-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hisakazu Nakayama. Retrieved from https://idiyas.com/inventor/hisakazu-nakayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5

% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 37(Granted Patents)


Location History:

  • Koshi, JP (2010 - 2014)
  • Kumamoto, JP (2003 - 2019)

Company Filing History:

goldMedal5 out of 10,933 
 
Tokyo Electron Limited
 patents

Years Active: 2003-2019

Loading Chart...
5 patents (USPTO):Explore Patents
1. 10422551 - Substrate liquid processing apparatus, and control method of heater unit (2019-09-24),
2. 8670656 - Liquid heating unit, liquid processing apparatus including the same, and liquid processing method (2014-03-11),
3. 7868270 - Temperature control for performing heat process in coating/developing system for resist film (2011-01-11),
4. 7755003 - Temperature control for performing heat process on resist film (2010-07-13),
5. 6654668 - Processing apparatus, processing system, distinguishing method, and detecting method (2003-11-25),

Title: Hisakazu Nakayama: Innovator in Liquid Processing Technology

Introduction

Hisakazu Nakayama is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of liquid processing technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and safety of liquid heating and processing systems.

Latest Patents

Hisakazu Nakayama's latest patents include innovative devices such as a substrate liquid processing apparatus and a control method for a heater unit. The control device is designed to manage the power supplied to a heater unit, ensuring that the maximum temperature of the processing liquid does not exceed a predetermined upper limit. This is achieved by cutting off the power supply when a potential overheating event is detected. Additionally, he has developed a liquid heating unit that monitors the temperature of the liquid storage tank or pipe using radiated light. This unit is part of a broader liquid processing apparatus and method that enhances the efficiency of liquid heating.

Career Highlights

Hisakazu Nakayama is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His role involves the development of advanced technologies that improve liquid processing systems. His expertise in this area has positioned him as a key figure in the innovation of liquid heating technologies.

Collaborations

Throughout his career, Nakayama has collaborated with notable colleagues such as Jun Ookura and Eiichi Sekimoto. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Hisakazu Nakayama's contributions to liquid processing technology exemplify the impact of innovative thinking in engineering. His patents reflect a commitment to improving safety and efficiency in industrial applications. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…