Location History:
- Hatano, JP (1986 - 1991)
- Shizuoka-ken, JP (1998)
- Suyama Susono, JP (2001)
Company Filing History:
Years Active: 1986-2001
Title: Hisaharu Obinata: Innovator in Sputtering Technology
Introduction
Hisaharu Obinata is a notable inventor based in Suyama Susono, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 4 patents. His work focuses on improving the efficiency and effectiveness of sputtering apparatuses, which are essential in various manufacturing processes.
Latest Patents
Obinata's latest patents include innovative designs that enhance sputtering apparatus functionality. One of his key inventions is the "Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly." This apparatus features a vacuum housing and a substrate holder, along with a composite sputtering cathode assembly that includes multiple targets and shields. This design ensures that only sputtering particles directed perpendicularly to the substrate are applied, resulting in a uniform film thickness. Another significant patent is the "Small size sputtering target and high vacuum sputtering apparatus." This apparatus maintains a vacuum chamber pressure of less than 1.times.10.sup.-3 Torr, allowing for improved film thickness distribution and enhanced coverage symmetry during sputtering.
Career Highlights
Obinata is associated with Nihon Shinku Gijutsu Kabushiki Kaisha, where he continues to develop advanced sputtering technologies. His work has been instrumental in pushing the boundaries of what is possible in the field of material deposition.
Collaborations
Throughout his career, Obinata has collaborated with esteemed colleagues such as Morohisa Tamura and Yasushi Higuchi. These partnerships have fostered innovation and contributed to the advancement of sputtering technology.
Conclusion
Hisaharu Obinata's contributions to sputtering technology are noteworthy, with several patents that reflect his innovative spirit. His work continues to influence the industry, making significant strides in the efficiency of sputtering processes.