Company Filing History:
5 out of 1,121 
2 out of 1,306 
Years Active: 2009-2025
Title: Hiroyuki Yashiki: Innovator in Substrate Processing Technologies
Introduction
Hiroyuki Yashiki is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 7 patents. His innovative approaches have advanced the technology used in various applications, particularly in the semiconductor industry.
Latest Patents
Yashiki's latest patents include a substrate processing method that involves an oxidation step. This method heats multiple substrates in an oxidation space while supplying oxygen or ozone gas to transform the surface layers of molybdenum films into molybdenum trioxide. Following this, a transfer step moves the substrates to an etching space, where an etching liquid is applied to dissolve the molybdenum trioxide surface layers, leaving the underlying molybdenum intact.
Another notable patent is for a substrate processing apparatus and a standby method for an ejection head. In this design, the ejection surface of the head is immersed in a liquid during standby, preventing the drying of outlets and flow passages. This innovation helps to avoid clogging and ensures efficient operation when the ejection head resumes processing.
Career Highlights
Throughout his career, Hiroyuki Yashiki has worked with notable companies such as Screen Holdings Co., Ltd. and Dainippon Screen Manufacturing Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in substrate processing.
Collaborations
Yashiki has collaborated with esteemed colleagues, including Masanobu Sato and Eiji Fukatsu. These partnerships have fostered a creative environment that has led to the development of innovative solutions in their field.
Conclusion
Hiroyuki Yashiki's contributions to substrate processing technologies exemplify his dedication to innovation. His patents reflect a deep understanding of the complexities involved in substrate treatment, making him a key figure in the industry. His work continues to influence advancements in semiconductor manufacturing and related fields.