Company Filing History:
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Years Active: 2001-2008
Title: Hiroyuki Yaegashi: Innovator in Thin Film Transistor Technology
Introduction
Hiroyuki Yaegashi is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of thin film transistors, holding a total of 6 patents. His innovative work has advanced the technology used in various electronic devices.
Latest Patents
One of his latest patents involves a thin film transistor device and the method of manufacturing it. In this invention, a polysilicon film is formed in a predetermined region on a glass substrate. Subsequently, a gate insulating film and a gate electrode, which is narrower than the gate insulating film, are created. An interlayer insulating film and an ITO film are then applied to the overall surface. N-type source/drain regions with an LDD structure are formed by implanting n-type impurities into the polysilicon film. The process continues with the formation of p-type source/drain regions in a p-type TFT forming region, followed by the creation of a pixel electrode through etching the ITO film while using a resist film as a mask.
Career Highlights
Hiroyuki Yaegashi has worked with notable companies such as Sharp Corporation and Fujitsu Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the electronics sector.
Collaborations
Throughout his career, Yaegashi has collaborated with talented individuals, including Takuya Watanabe and Kazushige Hotta. These partnerships have fostered innovation and creativity in his projects.
Conclusion
Hiroyuki Yaegashi's contributions to thin film transistor technology have made a lasting impact in the field of electronics. His innovative patents and collaborations with esteemed colleagues highlight his dedication to advancing technology.