Nagoya, Japan

Hiroyuki Umetani

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Umetani. Retrieved from https://idiyas.com/inventor/hiroyuki-umetani-vrmkm6f7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Hiroyuki Umetani: Innovator in Finite Element Analysis

Introduction

Hiroyuki Umetani is a notable inventor based in Nagoya, Japan. He has made significant contributions to the field of finite element analysis, particularly in understanding the relationship between geometric distortion and analysis error.

Latest Patents

Umetani holds a patent for a process that estimates the relationship between element distortion and analysis error. This innovative process involves using a computer to analyze geometric distortions of elements that represent the shape of an object. The patent outlines a method for assuming various deformation modes, such as tension, bending, shear, and torsion, to estimate the associated analysis errors.

Career Highlights

Hiroyuki Umetani is affiliated with Toyota Central R&D Labs, Inc., where he applies his expertise in finite element methods. His work has been instrumental in enhancing the accuracy of analysis results in engineering applications.

Collaborations

Umetani has collaborated with notable colleagues, including Noboru Kikuchi and Minako Sekiguchi, contributing to advancements in their respective fields.

Conclusion

Hiroyuki Umetani's innovative work in finite element analysis and his patent on estimating analysis errors highlight his valuable contributions to engineering and technology. His efforts continue to influence the accuracy and reliability of engineering analyses.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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