Hiroyuki Teshima

Title: Hiroyuki Teshima: Innovator in Silicon Nitride Technology

Introduction

Hiroyuki Teshima is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon nitride substrates. With a total of two patents to his name, Teshima's work has advanced the technology used in electronic components.

Latest Patents

Teshima's latest patents include innovations in silicon nitride sintered substrates and ceramic circuit substrates. One of his notable patents describes a large-sized silicon nitride sintered substrate and a method for producing it. This substrate features a main surface larger than a square with a side length of 120 mm. The patent specifies that the density ratio of the central area to the end area of the substrate is 0.98 or higher, with a void fraction of 1.80% or lower in the central area. Additionally, he has developed a method for producing a ceramic circuit substrate, which involves forming brazing regions on a ceramic substrate and bonding metal plates through a heating process.

Career Highlights

Throughout his career, Hiroyuki Teshima has worked with notable companies such as Hitachi Metals, Ltd. and Proterial, Ltd. His experience in these organizations has allowed him to refine his expertise in materials engineering and innovation.

Collaborations

Teshima has collaborated with esteemed colleagues, including Hisayuki Imamura and Suguru Fujita. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Hiroyuki Teshima's contributions to silicon nitride technology and ceramic substrates highlight his role as an influential inventor in the field. His innovative patents and collaborations reflect his commitment to advancing materials science.