Hiroyuki Shima

Title: Hiroyuki Shima: Innovator in Photosensitive Resin Technology

Introduction

Hiroyuki Shima is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of materials science, particularly in the development of methods for removing photosensitive resins used in various industrial applications.

Latest Patents

Hiroyuki Shima holds a patent for a method of removing photosensitive resin and photosensitive resin. This innovative method is capable of completely removing a photosensitive resin employed as a photoresist in an etching process for etching aluminum films and their derivatives. The process improves the durability of the apparatus used for removing the photosensitive resin. The method involves producing a mixed gas by combining fluorine compound gas and steam, which is then excited with microwaves to gasify the photosensitive resin.

Career Highlights

Throughout his career, Hiroyuki Shima has worked with prominent companies in the semiconductor industry. He has been associated with Ryoden Semiconductor System Engineering Corporation and Mitsubishi Electric Corporation, where he has contributed to advancements in semiconductor technology.

Collaborations

Hiroyuki Shima has collaborated with various professionals in his field, including his coworker Tadashi Nishioka. Their joint efforts have furthered the development of innovative solutions in the industry.

Conclusion

Hiroyuki Shima's work in the field of photosensitive resin technology showcases his innovative spirit and dedication to advancing industrial processes. His contributions have had a lasting impact on the semiconductor industry and continue to influence future developments.