Kudamatsu, Japan

Hiroyuki Shichida


Average Co-Inventor Count = 5.7

ph-index = 9

Forward Citations = 804(Granted Patents)


Company Filing History:


Years Active: 1995-2007

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18 patents (USPTO):Explore Patents

Title: Hiroyuki Shichida: A Pioneer in Substrate Holding Technologies

Introduction

Hiroyuki Shichida, an innovative inventor from Kudamatsu, Japan, has made significant contributions to the field of plasma processing technology. With a total of 18 patents to his name, he has been a driving force in developing methods that enhance the quality and efficiency of substrate handling in various applications.

Latest Patents

Among his latest inventions, Shichida holds patents for an electrode cover for a plasma processing apparatus and a novel method of holding substrates. His unique substrate holding system is designed to reduce foreign substances on the back surface of the substrate. This system incorporates a ring-shaped leakage-proof surface, smooth areas on the specimen table that correspond to the substrate's periphery, and contact holding portions located within the substrate's perimeter. Additionally, his technology employs electrostatic attraction means to firmly fix the substrate by ensuring contact between its back surface and the ring-shaped surface. This innovation allows the substrate to interact safely with a cooling surface while preventing contact in significant areas, thus maintaining optimal conditions for processing.

Career Highlights

Hiroyuki Shichida’s career includes impressive tenures at prominent companies, such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His work at these organizations has contributed profoundly to advancements in plasma processing technologies and substrate handling methods, further solidifying his reputation in the field.

Collaborations

Throughout his career, Shichida has collaborated with fellow inventors like Naoyuki Tamura and Tsunehiko Tsubone. These collaborations have fostered the sharing of ideas and have facilitated the development of innovative solutions that have advanced their respective fields.

Conclusion

Hiroyuki Shichida stands out as an exceptional inventor whose innovations have greatly impacted the plasma processing industry. With 18 patents and a commitment to excellence, he continues to push the boundaries of technology, improving the efficiency and reliability of substrate handling methods. His contributions will undoubtedly influence future advancements in this vital area of research and development.

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