Company Filing History:
3 out of 10,341 
Years Active: 2024-2025
Title: Hiroyuki Onoda: Innovator in Substrate Processing Technology
Introduction
Hiroyuki Onoda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing, holding two patents that showcase his innovative approach to technology. His work focuses on methods and devices that enhance the efficiency and effectiveness of substrate processing.
Latest Patents
Hiroyuki Onoda's latest patents include a substrate processing method and a substrate processing device. The substrate processing method involves forming a silicon-containing film by creating an adsorption layer on a substrate with a concave pattern. This process utilizes a silicon-containing gas and plasma of a reaction gas to facilitate the formation of the film. Additionally, the method includes etching the silicon-containing film, which is modified using a He-containing plasma. The plasma processing device comprises a processing chamber with a partition plate that separates the reaction chamber from the plasma generating chamber. This device is designed to supply active species from the plasma to the reaction chamber, enhancing the processing capabilities.
Career Highlights
Hiroyuki Onoda has established himself as a key figure in the substrate processing industry. His work at Tokyo Electron Limited has allowed him to develop cutting-edge technologies that are widely recognized in the field. His innovative methods have contributed to advancements in semiconductor manufacturing and other related industries.
Collaborations
Hiroyuki Onoda has collaborated with notable colleagues such as Munehito Kagaya and Tadashi Mitsunari. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of new technologies.
Conclusion
Hiroyuki Onoda's contributions to substrate processing technology highlight his role as an influential inventor. His patents reflect a commitment to innovation and excellence in the field. His work continues to impact the industry positively, paving the way for future advancements.