This inventor holds 2 USPTO granted patents. Top assignee: Niterra Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Hiroyuki Nakamura’s Patent Work in Substrate-Holding Technology.
Introduction
Hiroyuki Nakamura is an inventor associated with Nagoya, Japan, and Niterra Co., Ltd. His listed patent work concerns substrate-holding members designed with features such as raised support pins, vent holes, and airflow channels. He is credited with 2 patents.
Latest Patents
Nakamura’s listed patents describe two substrate-holding member designs.
The first design uses a base body with an outer peripheral region, a vent hole near the outer edge, and multiple pin-shaped projections. Some projections in the outer region have a two-part structure: a first element rises from the base body, while a narrower second element rises from its upper surface. The smaller upper surface of the second element distinguishes this stepped support-pin configuration.
The second design features a flat-plate base body with at least one vent hole opening on its upper surface and a groove that connects to the vent hole and opens on the lower surface. It also includes raised projections on the upper surface and a ring-shaped projection along the outer edge. The patent description specifies that the groove’s cross-sectional area, measured perpendicular to the flow path, is at least 1.2 mm².
Career Highlights
Nakamura’s listed inventions focus on the structure and airflow characteristics of substrate-holding members. The designs combine surface supports with venting features, addressing how a substrate is held while air can pass through the member.
Collaborations
Nakamura is associated with Niterra Co., Ltd. His listed coworker is Kazuaki Ooyachi.
Conclusion
Hiroyuki Nakamura’s patent portfolio highlights two substrate-holding member designs that integrate raised support features with venting and airflow structures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile