This inventor holds 1 USPTO granted patent. Top assignee: Nihon Shinku Gijutsu Kabushiki Kaisha. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999
Title: Hiroyuki Kinpara: Innovator in Ion Pump Technology
Introduction
Hiroyuki Kinpara is a notable inventor based in Chigasaki, Japan. He has made significant contributions to the field of ion pump technology, particularly with his innovative designs that enhance performance and efficiency. His work has led to advancements that are crucial for various applications requiring high vacuum levels.
Latest Patents
Hiroyuki Kinpara holds a patent for an anode-cathode structure for an ion pump. This invention involves a sputter ion pump where the ratio of the length L to the diameter D of each anode cell is specifically defined. This design increases the critical vacuum level that can be achieved and enhances the exhaust speed of the pump. His patent is a testament to his expertise and innovative thinking in the field.
Career Highlights
Kinpara is associated with Nihon Shinku Gijutsu Kabushiki Kaisha, a company that specializes in vacuum technology. His role in the company has allowed him to focus on developing cutting-edge solutions that address the challenges faced in high vacuum applications. His contributions have been instrumental in advancing the company's technological capabilities.
Collaborations
Throughout his career, Hiroyuki Kinpara has collaborated with talented individuals such as Guo Hua Shen and Nozomu Takagi. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in the field of ion pumps.
Conclusion
Hiroyuki Kinpara's work in ion pump technology exemplifies the spirit of innovation and dedication to advancing scientific knowledge. His contributions continue to impact the industry positively, and his patent reflects his commitment to excellence in engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile