Company Filing History:
Years Active: 1990-1993
Title: Hiroyuki Kamijo: Innovator in Semiconductor Manufacturing
Introduction
Hiroyuki Kamijo is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of four patents. His innovative techniques have advanced the efficiency and effectiveness of semiconductor devices.
Latest Patents
Kamijo's latest patents focus on methods of manufacturing semiconductor devices. One notable patent describes a selective anisotropic etching process using Reactive Ion Etching (RIE) on a first poly-Si film formed on a gate oxide film. This method ensures that the poly-Si film is not entirely removed, leaving part of it intact. The entire surface is then covered with a second poly-Si film, followed by RIE application. This technique prevents damage to the gate oxide film near the poly-Si gate and the interface between the gate oxide film and the substrate. A subsequent chemical dry etching process, which does not harm the gate insulation film, is applied to remove the second poly-Si film and the underlying portion of the first polysilicon film.
Another patent by Kamijo also details a method of manufacturing semiconductor devices through selective etching by RIE. Similar to the previous patent, this method involves leaving part of the poly-Si film unremoved, followed by covering the surface with a poly-Si film and applying RIE. This innovative approach again aims to protect the gate oxide film and the interface from damage, ensuring the integrity of the semiconductor device.
Career Highlights
Hiroyuki Kamijo is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to develop and refine his innovative techniques in semiconductor manufacturing. His contributions have been instrumental in enhancing the performance and reliability of semiconductor devices.
Collaborations
Kamijo has collaborated with notable coworkers, including Yuuichi Mikata and Toshiro Usami. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technology.
Conclusion
Hiroyuki Kamijo's work in semiconductor manufacturing exemplifies the spirit of innovation. His patents reflect a commitment to advancing technology while ensuring the integrity of semiconductor devices. His contributions continue to influence the field and inspire future advancements.