Location History:
- Tokyo, JP (1994 - 1995)
- Tokyo-To, JP (1996 - 2007)
Company Filing History:
Years Active: 1994-2007
Title: Hiroyuki Inomata: Innovator in Photomask Technology
Introduction
Hiroyuki Inomata is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His innovative methods have advanced the inspection and production processes of photomasks, which are critical components in semiconductor manufacturing.
Latest Patents
Inomata's latest patents include a method of inspecting photo-masks and a phase shift photomask production method. The method of inspecting photo-masks enables effective destruction inspection, allowing for both contact-type and cross-section inspections. This method utilizes two photo-masks manufactured under identical conditions, enhancing the reliability of the inspection process. The phase shift photomask production method involves coating a transparent film onto a substrate and irradiating it with energy rays to create a phase shifter pattern. This innovative approach minimizes defects by preventing dust formation in critical areas of the substrate.
Career Highlights
Hiroyuki Inomata is associated with Dai Nippon Printing Co., Ltd., where he has been instrumental in developing advanced photomask technologies. His work has not only improved production efficiency but has also contributed to the overall quality of photomasks used in the semiconductor industry.
Collaborations
Inomata has collaborated with notable colleagues such as Kazuhiro Tabuchi and Takashi Yamauchi. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Hiroyuki Inomata's contributions to photomask technology exemplify the impact of innovation in the semiconductor industry. His patents reflect a commitment to enhancing inspection and production methods, ultimately leading to improved product quality.