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For the Inventor, By the Inventor

Tokyo, Japan

Hiroyuki Inomata

This inventor holds 4 USPTO granted patents. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 1994-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Inomata. Retrieved from https://idiyas.com/inventor/hiroyuki-inomata-tth58kqn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4

% Patents Active = 75.0

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 38(Granted Patents)


Location History:

  • Tokyo, JP (1994 - 1995)
  • Tokyo-To, JP (1996 - 2007)

Company Filing History:

goldMedal4 out of 3,208 
 
Dai Nippon Printing Co., Ltd.
 patents

Years Active: 1994-2007

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4 patents (USPTO):Explore Patents
1. 7289657 - Method of inspecting photo-mask (2007-10-30),
2. 5556724 - Phase shift photomask and method of producing same (1996-09-17),
3. 5397665 - Photomask with pellicle and method of treating and storing the same (1995-03-14),
4. 5330053 - Case for photomask (1994-07-19),

Title: Hiroyuki Inomata: Innovator in Photomask Technology

Introduction

Hiroyuki Inomata is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His innovative methods have advanced the inspection and production processes of photomasks, which are critical components in semiconductor manufacturing.

Latest Patents

Inomata's latest patents include a method of inspecting photo-masks and a phase shift photomask production method. The method of inspecting photo-masks enables effective destruction inspection, allowing for both contact-type and cross-section inspections. This method utilizes two photo-masks manufactured under identical conditions, enhancing the reliability of the inspection process. The phase shift photomask production method involves coating a transparent film onto a substrate and irradiating it with energy rays to create a phase shifter pattern. This innovative approach minimizes defects by preventing dust formation in critical areas of the substrate.

Career Highlights

Hiroyuki Inomata is associated with Dai Nippon Printing Co., Ltd., where he has been instrumental in developing advanced photomask technologies. His work has not only improved production efficiency but has also contributed to the overall quality of photomasks used in the semiconductor industry.

Collaborations

Inomata has collaborated with notable colleagues such as Kazuhiro Tabuchi and Takashi Yamauchi. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Hiroyuki Inomata's contributions to photomask technology exemplify the impact of innovation in the semiconductor industry. His patents reflect a commitment to enhancing inspection and production methods, ultimately leading to improved product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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