The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 1995
Filed:
Nov. 04, 1993
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
A photomask with pellicle which is treated so that even if the obverse and reverse surfaces of the photomask are stained with a trace amount of contaminative particles during cleaning, water content and a low-volatile component are prevented from adhering to such contaminative particles during storage, thereby preventing the photomask from becoming stained with passage of time. Also disclosed is a method of treating and storing the photomask. The photomask is subjected to a hydrophobic treatment by providing the obverse and reverse surfaces thereof with a trimethylsilyl film formed by a reaction of OH groups in these surfaces with 1,1,1,3,3,3-hexamethyldisilazane. Even if contaminative particles are attached to the obverse and reverse surfaces of the photomask in a trace amount during cleaning, no water content or low-volatile component will adhere to such contaminative particles during storage and/or transport of the photomask with a pellicle attached thereto, so that the photomask is prevented from becoming stained with passage of time. Accordingly, the photomask with pellicle can be stably stored for a long period of time and also stably transported, and it can be used any number of times for a long period of time.