The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2007
Filed:
Apr. 10, 2003
Applicants:
Morihisa Hoga, Tokyo-to, JP;
Hiroyuki Inomata, Tokyo-to, JP;
Inventors:
Morihisa Hoga, Tokyo-to, JP;
Hiroyuki Inomata, Tokyo-to, JP;
Assignee:
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask comprises performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product.