Location History:
- Los Gatos, CA (US) (1976 - 1978)
- Saratoga, CA (US) (1983 - 1993)
Company Filing History:
Years Active: 1976-1993
Title: Innovations by Hiroyuki Hiraoka
Introduction
Hiroyuki Hiraoka is a prominent inventor based in Saratoga, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor etching processes.
Latest Patents
Hiraoka's latest patents include innovative methods such as the "Spin on oxygen reactive ion etch barrier." This patent describes the use of reaction products from organosilane compounds or polydiphenylsilazane compounds combined with a novolac resin that contains phenolic groups. These materials serve as O₂ RIE barrier materials in semiconductor etching processes, exhibiting low O₂ etch rates and the ability to be spun on to create crack-free thick layers. Another notable patent is the "Spray silylation of photoresist images," which details a method for making photoresist images resistant to reactive ion etching by treating them with poly(dimethylsilazane).
Career Highlights
Hiroyuki Hiraoka has had a distinguished career at the International Business Machines Corporation (IBM). His innovative approaches and patented technologies have significantly advanced the field of semiconductor manufacturing. His expertise in reactive ion etching has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Hiraoka has collaborated with notable colleagues, including Carlton G Willson and Joachim Bargon. These collaborations have fostered a productive environment for innovation and have led to the development of groundbreaking technologies in semiconductor processing.
Conclusion
Hiroyuki Hiraoka's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in semiconductor manufacturing processes.