The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 1984
Filed:
Jun. 28, 1983
Applicant:
Inventors:
Hiroyuki Hiraoka, Saratoga, CA (US);
Donald C Hofer, Morgan Hill, CA (US);
Robert D Miller, San Jose, CA (US);
Lester A Pederson, San Jose, CA (US);
Carlton G Willson, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430323 ; 430313 ; 430314 ; 430317 ; 430316 ; 430270 ; 430272 ; 427 38 ; 156643 ; 1566591 ; 156668 ;
Abstract
A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.