Hiroyuki Endo

Title: Hiroyuki Endo: Innovator in Ferroelectric Technology

Introduction

Hiroyuki Endo is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of ferroelectric materials, particularly through his innovative patent related to ferroelectric thin-film technology. His work is instrumental in advancing the applications of ferroelectric devices.

Latest Patents

Hiroyuki Endo holds a patent for a "Ferroelectric thin-film laminated substrate, ferroelectric thin-film device, and manufacturing method of ferroelectric thin-film laminated substrate." This invention includes a substrate with a lower electrode layer made of platinum or a platinum alloy, a ferroelectric thin-film layer composed of sodium potassium niobate, an upper electrode intermediate layer made of a metal with less oxidizability than titanium, and an upper electrode layer made of aluminum or an aluminum alloy. The unique structure allows for enhanced performance in ferroelectric devices.

Career Highlights

Hiroyuki Endo is currently employed at Sumitomo Chemical Company, Limited, where he continues to innovate in the field of materials science. His expertise in ferroelectric technology has positioned him as a key figure in the development of advanced electronic components.

Collaborations

Hiroyuki Endo has collaborated with notable colleagues, including Fumimasa Horikiri and Kenji Shibata. These partnerships have fostered a collaborative environment that enhances research and development efforts in their respective fields.

Conclusion

Hiroyuki Endo's contributions to ferroelectric technology through his patent and work at Sumitomo Chemical Company, Limited, highlight his role as an influential inventor. His innovative approaches continue to shape the future of electronic materials and devices.